Vaporization from liquid film of binary mixture in a centrifugal molecular still.
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چکیده
منابع مشابه
Molecular dynamics simulation of a binary mixture lubricant for use in hard disk interfaces
In Hard Disk Drives (HDD), it is necessary to decrease the Flying Height (FH) between the head and the disk (currently, FH is around 3-5 nm) so as to increase recording densities. Retaining the solid lubricant has become a difficult proposition owing to intermittent contact between the surfaces. ZTMD and Z are used as solid lubricant to lubricate these interfaces. In this paper, the behavior of...
متن کاملMolecular dynamics simulation of a binary mixture lubricant for use in hard disk interfaces
In Hard Disk Drives (HDD), it is necessary to decrease the Flying Height (FH) between the head and the disk (currently, FH is around 3-5 nm) so as to increase recording densities. Retaining the solid lubricant has become a difficult proposition owing to intermittent contact between the surfaces. ZTMD and Z are used as solid lubricant to lubricate these interfaces. In this paper, the behavior of...
متن کاملLiquid-vapor phase behavior of a symmetrical binary fluid mixture
Using Monte Carlo simulation and mean-field calculations, we study the liquid-vapor phase diagram of a square-well binary fluid mixture as a function of a parameter d measuring the relative strength of interactions between particles of dissimilar and similar species. The results reveal a rich variety of liquid-vapor coexistence behaviors as d is tuned. Specifically, we uncover critical end poin...
متن کاملmolecular dynamics simulation of a binary mixture lubricant for use in hard disk interfaces
in hard disk drives (hdd), it is necessary to decrease the flying height (fh) between the head and the disk (currently, fh is around 3-5 nm) so as to increase recording densities. retaining the solid lubricant has become a difficult proposition owing to intermittent contact between the surfaces. ztmd and z are used as solid lubricant to lubricate these interfaces. in this paper, the behavior of...
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ژورنال
عنوان ژورنال: JOURNAL OF CHEMICAL ENGINEERING OF JAPAN
سال: 1989
ISSN: 0021-9592,1881-1299
DOI: 10.1252/jcej.22.291